QL-ICP-OES-MICS
High-performance ICP-OES spectrometer with full-spectrum (165–900 nm) coverage, simultaneous multi-element analysis (~70 elements), and ppb-level detection. Delivers rapid, automated, and reliable elemental analysis for modern analytical laboratories.
OVERVIEW
Description
The QL-ICP-OES-MICS Inductively Coupled Plasma Optical Emission Spectrometer is a high-performance analytical instrument designed for fast and accurate elemental analysis. Moreover, it enables simultaneous multi-element analysis. Covering a full wavelength range of 165–900 nm, the system enables qualitative, semi-quantitative, and quantitative analysis of approximately 70 elements in a single run.
Equipped with a solid-state RF generator, a high-stability inductively coupled plasma source, and a full-spectrum cross-dispersion optical system, the QL-ICP-OES-MICS delivers trace-level detection. Accordingly, it detects concentrations down to ppb (10⁻⁹) with exceptional repeatability. Additionally, a scientific-grade, large-format CCD detector with deep thermoelectric cooling ensures low noise and high signal-to-noise ratio. This applies across the entire spectral range.
The system features fully automated operation including automatic plasma ignition, RF matching, wavelength calibration, and continuous real-time monitoring. As a result, it is designed for reliability and ease of use. Therefore, the QL-ICP-OES-MICS is ideal for routine and advanced analytical applications in environmental testing. It is also widely used in metallurgy, geology, chemical analysis, food safety, and industrial quality control laboratories.
Key Features & Performance
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Full-spectrum wavelength coverage: 165 – 900 nm
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Simultaneous analysis of ~70 elements
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Detection limits down to ppb (10⁻⁹) level
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Typical full analysis time: < 1 minute
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Wavelength repeatability (RSD): < 1.5%
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Single-exposure, direct-reading optical system
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Large-format CCD detector cooled to –45 °C
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Solid-state RF generator (800–1500 W, 27.12 MHz)
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High plasma power stability: ≤ 0.01%
Automation, Software & Operation
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Fully software-controlled operation
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Automatic plasma ignition and RF matching
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Automatic wavelength calibration at startup
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Real-time plasma and system monitoring
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Integrated diagnostics and performance verification
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Method development, data processing, and reporting tools
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Reduced operator intervention and consistent analytical conditions
Applications & Installation
Application Areas
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Environmental analysis (water, soil, sediments)
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Geological and mineral analysis
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Metallurgy and materials science
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Chemical and petrochemical quality control
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Food and agricultural testing
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Industrial production and incoming material inspection
Installation & Support
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Remote installation support with documentation and video guides
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Remote user training for operation and maintenance
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1-year manufacturer warranty (standard terms apply)













